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Hexagonal boron nitride substrate; forming a mask layer on the surface of the hexagonal boron nitride substrate, and forming a preset etching pattern exposing the surface of the hexagonal boron nitride substrate in the mask layer; in Depositing a metal layer on the surface of the mask layer and the preset etching pattern; peeling off the mask layer and the metal layer on the surface; annealing the hexagonal boron nitride substrate, and then removing the preset The metal layer in the pattern is etched, and a single-layer boron nitride atomic thickness step is obtained on the surface of the hexagonal boron nitride substrate.

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